Thermal formation of SiO2 films over NiSi, NiSi2 and CoSi2 via silicide decomposition
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Oxidation of sputtered molybdenum silicide thin films
2. Kinetics of the thermal oxidation of WSi2
3. Characterization of Thin Film Molybdenum Silicide Oxide
4. Oxidation of tantalum disilicide on polycrystalline silicon
5. Studies of steam‐oxidized WSi2by Auger sputter profiling
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