Author:
Jorke H.,Kibbel H.,Schäffler F.,Herzog H.-J.
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Properties of Si layers grown by molecular beam epitaxy at very low temperatures
2. H. Jorke and H. Kibbel, 183 (1989) 323.
3. Chemistry and Physics of Solid Surfaces VII;Herzog,1988
4. Semiconductors: Special Systems and Topics, Comprehensive Index for III/17a…i,1985
5. Kinetics of ordered growth of Si on Si(100) at low temperatures
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