Is electronic spin angular momentum conserved in gas-surface interactions? F and F+ with Si(100)

Author:

Field D.,Hydes A.J.,Klemperer D.F.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electrical potentials in RF discharges;Journal of Physics D: Applied Physics;1990-06-14

2. Formation and decay of metastable fluorine atoms in pulsed fluorocarbon/oxygen discharges monitored by laser‐induced fluorescence;Applied Physics Letters;1990-02-19

3. Optical spectroscopic study of mechanisms in CCl4plasma etching of Si;Journal of Applied Physics;1990-02

4. Spectroscopic studies of fluorescent emission in plasma etching of silicon nitride;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-03

5. Halogen adsorption on solid surfaces;Progress in Surface Science;1988-01

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