Formation and decay of metastable fluorine atoms in pulsed fluorocarbon/oxygen discharges monitored by laser‐induced fluorescence
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.102692
Reference19 articles.
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4. The design of plasma etchants
5. Spectroscopic diagnostics of CF4‐O2 plasmas during Si and SiO2 etching processes
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1. Global model of plasma chemistry in a low-pressure O2/F2discharge;Journal of Physics D: Applied Physics;2002-02-01
2. Laser-induced fluorescence from collisionally excited Si atoms in laser ablation plume;Journal of Applied Physics;1999-10
3. Measurement of Diffusion Coefficient of $\bf CF_{2}$ Radical in DC Pulsed $\bf CF_{4}/H_{2}$ Discharge Plasma;Japanese Journal of Applied Physics;1995-10-15
4. Time resolved study of a reactive low pressure plasma: Determination of basic data on electron‐fluorine collisions;Journal of Applied Physics;1995-10
5. Angular momentum state mixing and quenching of n=3 atomic hydrogen fluorescence;Chemical Physics;1995-06
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