Formation of silicide thin films by solid state reaction-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Formation of silicide thin films by solid state reaction

Published:1993-11 Issue: Volume:73 Page:153-161
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Gas P.,d'Heurle F.M.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference64 articles.

1. Reactive diffusion in thin films

2. VLSI Science and Technology;d'Heurle,1982

3. Synthesis and properties of epitaxial semiconducting silicides

Cited by 73 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization and Diffusion Kinetics of Silicon on AISI D2 Steel;Silicon;2023-10-23

2. In Situ Study of the Interface-Mediated Solid-State Reactions during Growth and Postgrowth Annealing of Pd/a-Ge Bilayers;ACS Applied Materials & Interfaces;2023-02-15

3. Te and Ge solid-state reaction: comparison between the 2D and 3D growth of α-GeTe;Journal of Materials Chemistry C;2023

4. New insights in GeTe growth mechanisms;Journal of Alloys and Compounds;2022-11

5. Tuning the Mn5Ge3 and Mn11Ge8 thin films phase formation on Ge(111) via growth process;Thin Solid Films;2022-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP