Synthesis of colloid silica coated with ceria nano-particles with the assistance of PVP-Reference-Cited by-同舟云学术

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Synthesis of colloid silica coated with ceria nano-particles with the assistance of PVP

Published:2015-06 Issue:6 Volume:26 Page:700-704
ISSN:1001-8417
Container-title:Chinese Chemical Letters
language:en
Short-container-title:Chinese Chemical Letters

Author:

Yu Lei,Liu Wei-Li,Zhang Ze-Fang,Song Zhi-Tang

Funder

National Integrate Circuit Research Program of China

National Natural Science Foundation of China

Science and Technology Council of Shanghai

Publisher

Elsevier BV

Subject

General Chemistry

Reference26 articles.

1. Investigation on the final polishing slurry and technique of silicon substrate in ULSI;Liu;Microelectron. Eng.,2003

2. Chemical mechanical planarization for microelectronics applications;Zantye;Mater. Sci. Eng. Rep.,2004

3. Material removal mechanism in chemical mechanical polishing: theory and modeling;Luo;IEEE Trans. Semicond. Manuf.,2001

4. Mechano-chemical polishing of silicon wafers;Chen;J. Mater. Process. Technol.,2003

5. Chemical mechanical planarization: slurry chemistry, materials, and mechanisms;Krishnan;Chem. Rev.,2010

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3. Enhancing ceria slurry performance for shallow trench isolation chemical mechanical polishing through non-ionic surfactant addition;The International Journal of Advanced Manufacturing Technology;2023-09-05

4. Enhancing Ceria Slurry Performance for Shallow Trench Isolation Chemical Mechanical Polishing through Non-Ionic Surfactant Addition;2023-03-28

5. Modified Stöber synthesis of SiO2@Ag nanocomposites and their enhanced refractive index sensing applications;Physica B: Condensed Matter;2022-08

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