Influence of process pressure on HW-CVD deposited a-Si:H films-Reference-Cited by-同舟云学术

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Influence of process pressure on HW-CVD deposited a-Si:H films

Published:2005-01 Issue:3 Volume:85 Page:301-312
ISSN:0927-0248
Container-title:Solar Energy Materials and Solar Cells
language:en
Short-container-title:Solar Energy Materials and Solar Cells

Author:

Jadkar S.R.,Sali J.V.,Kshirsagar S.T.,Takwale M.G.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Reference34 articles.

1. Y. Hamakawa, Proceeding of Sixth International Photovoltaic Science Engineering Conference, New Delhi, India, 1992, p. 1.

2. Reversible conductivity changes in discharge‐produced amorphous Si

3. Low defect density amorphous hydrogenated silicon prepared by homogeneous chemical vapor deposition

4. Optical and electrical properties of amorphous silicon films prepared by photochemical vapor deposition

5. An alternative method of preparing hydrogen-doped evaporated amorphous silicon preliminary report

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of substrate temperature and post-deposition annealing on intrinsic a-SiOx:H film for n-Cz-Si wafer passivation;Journal of Materials Science: Materials in Electronics;2016-01-20

2. Blue to red emission from as-deposited nc-silicon/silicon dioxide by hot wire chemical vapor deposition;Thin Solid Films;2015-11

3. Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced CVD;Plasma Science and Technology;2007-04

4. Amorphous Silicon Film Deposition by Low Temperature Catalytic Chemical Vapor Deposition (<150 °C) and Laser Crystallization for Polycrystalline Silicon Thin-Film Transistor Application;Japanese Journal of Applied Physics;2006-02-17

5. Photovoltaics literature survey (no. 36);Progress in Photovoltaics: Research and Applications;2005

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