Low defect density amorphous hydrogenated silicon prepared by homogeneous chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.92972
Reference27 articles.
1. Kinetics and mechanism of amorphous hydrogenated silicon growth by homogeneous chemical vapor deposition
2. Reversible conductivity changes in discharge‐produced amorphous Si
3. Infrared Spectrum and Structure of Hydrogenated Amorphous Silicon
4. Proton Magnetic Resonance Spectra of Plasma-Deposited Amorphous Si: H Films
5. Proton Magnetic Resonance Spectra of Plasma-Deposited Amorphous Si: H Films
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