Room Temperature Growth of Hydrogenated Amorphous Silicon Films by Dielectric Barrier Discharge Enhanced CVD
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference13 articles.
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4. A New Approach to Plasma CVD of TiO2Photocatalyst on γ-Al2O3Pellet Filled in Dielectric Barrier Discharges at Atmospheric Pressure
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Dielectric Barrier Discharge Plasma Deoxidation of Copper Surfaces in an Ar/SiH4 Atmosphere;Plasma Chemistry and Plasma Processing;2022-06-23
2. Cold deposition of large-area amorphous hydrogenated silicon films by dielectric barrier discharge chemical vapor deposition;Thin Solid Films;2011-05
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