Thin-film crystal growth of microcrystalline silicon using very-high-frequency hollow-electrode-enhanced glow plasma
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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1. Room temperature synthesized highly conducting B-doped nanocrystalline silicon thin films on flexible polymer substrates by ICP-CVD;Applied Surface Science;2022-05
2. Optimized hydrogen concentration within a remotely induced hollow-anode plasma for fast chemical-vapor-deposition of photosensitive and <110>-preferential microcrystalline silicon thin-films;Thin Solid Films;2020-01
3. Remotely induced high-density hollow-anode plasma and its application to fast deposition of photosensitive microcrystalline silicon thin film with preferential <110> orientation;AIP Advances;2019-05
4. Effect of deposition rate on the growth mechanism of microcrystalline silicon thin films using very high frequency PECVD;Optik;2019-02
5. Performance of a large-scale barrier discharge plume improved by an upstream auxiliary barrier discharge;Applied Physics Letters;2016-11-14
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