Ion energy control and its applicability to plasma enhanced atomic layer deposition for synthesizing titanium dioxide films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference29 articles.
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2. Physics of Semiconductor Devices;Sze,2007
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4. Crystallinity of inorganic films grown by atomic layer deposition: overview and general trends;Miikkulainen;J. Appl. Phys.,2013
5. Temperature dependence of SiO2 film growth with plasma-enhanced atomic layer deposition;Kobayashi;Thin Solid Films,2012
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