Growth of diamond thin films on SiCN underlayers by hot filament chemical vapor deposition-Reference-Cited by-同舟云学术

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Growth of diamond thin films on SiCN underlayers by hot filament chemical vapor deposition

Published:2017-08 Issue: Volume:635 Page:53-57
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Katamune Yūki,Mori Hiroto,Izumi Akira

Funder

Japanese Society for the Promotion of Science

Osawa Scientific Studies Grants Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference25 articles.

1. Friction and wear properties of TiN, TiAlN, AlTiN and CrAlN PVD nitride coatings;Liu;Int. J. Refract. Met. Hard Mater.,2012

2. Chemical vapour deposition diamond coatings on cemented carbide tools;Oakes;Surf. Coat. Technol.,1991

3. Interactions of hard metal substrates during diamond deposition;Haubner;Int. J. Refract. Met. Hard Mater.,1998

4. Effect of the chemical nature of transition-metal substrates on chemical-vapor deposition of diamond;Chen;J. Appl. Phys.,1993

5. Graphitization and particle size analysis of pyrolyzed cobalt phthalocyanine/carbon catalysts for oxygen reduction in fuel cells;Dignard-Bailey;J. Mater. Res.,1994

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1. Low-volume-loss surface polishing with a krypton fluoride excimer laser for polycrystalline diamond films;Applied Physics Letters;2023-07-17

2. Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition;Thin Solid Films;2020-02

3. Tribological Properties of Cr(Si)CN Coatings Sliding Against Different Mating Balls in Water;Journal of Materials Engineering and Performance;2019-02-27

4. Low-temperature silicon oxidation using oxidizing radicals produced by catalytic decomposition of H2O/H2 on heated tungsten wire;Japanese Journal of Applied Physics;2018-10-24

5. Computer Simulation of Temperature Parameter for Diamond Formation by Using Hot-Filament Chemical Vapor Deposition;Coatings;2017-12-29

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