Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition-Reference-Cited by-同舟云学术

Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition

Published:2020-02 Issue: Volume:695 Page:137750
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Katamune Yūki^ORCID,Mori Hiroto,Morishita Fumihiro,Izumi Akira^ORCID

Funder

Yoshida Foundation

Osawa Scientific Studies Grants Foundation

Iketani Science and Technology Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference38 articles.

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4. Preparation and optical properties of SiCN thin films deposited by reactive magnetron sputtering;Li;J. Mater. Sci.,2017

5. Mechanical and optical properties of hard SiCN coatings prepared by PECVD;Jedrzejowski;Thin Solid Films,2004

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