Low-temperature silicon oxidation using oxidizing radicals produced by catalytic decomposition of H2O/H2 on heated tungsten wire-Reference-Cited by-同舟云学术

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Low-temperature silicon oxidation using oxidizing radicals produced by catalytic decomposition of H2O/H2 on heated tungsten wire

Published:2018-10-24 Issue:12 Volume:57 Page:120301
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Katamune Yūki,Negi Takanobu,Tahara Shinichi,Fukushima Kazuya,Izumi Akira

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/57/i=12/a=120301/pdf

Reference30 articles.

1. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method

2. Present status and future feasibility for industrial implementation of Cat-CVD (Hot-Wire CVD) technology

3. New application of Cat-CVD technology and recent status of industrial implementation

4. Low-Temperature Oxidation of Silicon Surface Using a Gas Mixture of H[sub 2] and O[sub 2] in a Catalytic Chemical Vapor Deposition System

5. Low-temperature nitridation of silicon surface using NH3-decomposed species in a catalytic chemical vapor deposition system

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1. Control of the chemical composition of silicon carbon nitride films formed from hexamethyldisilazane in H2/NH3 mixed gas atmospheres by hot-wire chemical vapor deposition;Thin Solid Films;2020-02

2. Solvent Effect on Structure, Morphology and Catalytic Activity on Ammonium Perchlorate of Nano-MgWO4;Nano;2019-10

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