Low-temperature nitridation of silicon surface using NH3-decomposed species in a catalytic chemical vapor deposition system
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119897
Reference16 articles.
1. The preparation, characterization and applications of silicon nitride thin films
2. The reaction of Si(100) 2×1 with NO and NH3: The role of surface dangling bonds
3. Thermally grown silicon nitride films for high‐performance MNS devices
4. Photoemission study of ammonia dissociation on Si(100) below 700 K
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