Development of Silicon Carbide Atomic Layer Etching Technology

Author:

Lee Kang-Il,Seok Dong Chan,Jang Soo Ouk,Choi Yong Sup

Funder

NFRI

NST

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Silicon carbide and diamond for high temperature device applications;Willander;J Mater Sci: Mater Electron,2006

2. Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface;Yamamura;CIRP Annals - Manufacturing Technology,2011

3. Rapid damage free shaping of silicon carbide using Reactive Atom Plasma (RAP) processing;Verma,2006

4. The surface morphology of the polycrystalline and single-crystal SiC treated with pure NF3 plasma and analysis on chemical reaction of SiC with NF3;Takatsugu;ECS Transactions,2007

5. Preliminary Study on Chemical Figuring and Finishing of Sintered SiC Substrate Using Atmospheric Pressure Plasma;Yamamura;Procedia CIRP,2012

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