Vacuum pump age effects by the exposure to the corrosive gases on the Cr etch rate as observed using optical emission spectroscopy in an Ar/O2/Cl2 mixed plasma-Reference-Cited by-同舟云学术

Vacuum pump age effects by the exposure to the corrosive gases on the Cr etch rate as observed using optical emission spectroscopy in an Ar/O2/Cl2 mixed plasma

Published:2016-03 Issue: Volume:603 Page:154-159
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Park Seolhye,Roh Hyun-Joon,Jang Yunchang,Jeong Sangmin,Ryu Sangwon,Choe Jae-Myung,Kim Gon-Ho

Funder

IT R&D program of MOTIE/KEIT

National Research Foundation of Korea

Brain Korea 21 Plus Project

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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