Plasma information-based virtual metrology (PI-VM) and mass production process control-Reference-Cited by-同舟云学术

Plasma information-based virtual metrology (PI-VM) and mass production process control

Published:2022-03-04 Issue:8 Volume:80 Page:647-669
ISSN:0374-4884
Container-title:Journal of the Korean Physical Society
language:en
Short-container-title:J. Korean Phys. Soc.

Author:

Park Seolhye^ORCID,Seong Jaegu^ORCID,Jang Yunchang,Roh Hyun-Joon,Kwon Ji-Won,Lee Jinyoung,Ryu Sangwon,Song Jaemin,Roh Ki-Baek,Noh Yeongil,Park Yoona,Jang Yongsuk,Cho Taeyoung,Yang Jae-Ho,Kim Gon-Ho

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy

Link

https://link.springer.com/content/pdf/10.1007/s40042-022-00452-8.pdf

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