Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing-Reference-Cited by-同舟云学术

Application of PI-VM for management of the metal target plasma etching processes in OLED display manufacturing

Published:2018-11-23 Issue:1 Volume:61 Page:014032
ISSN:0741-3335
Container-title:Plasma Physics and Controlled Fusion
language:
Short-container-title:Plasma Phys. Control. Fusion

Author:

Park Seolhye^ORCID,Cho Taeyoung,Jang Yongsuk,Noh Yeongil,Choi Younghoon,Cha Taewon,Lee Juyoung,Kim Byungsoo,Yang Jae-Ho,Hong Jeong-Jin,Park Youngkwan,Kim Gon-Ho,Jang Won-Hyouk

Publisher

IOP Publishing

Subject

Condensed Matter Physics,Nuclear Energy and Engineering

Link

http://iopscience.iop.org/article/10.1088/1361-6587/aae2db/pdf

Reference15 articles.

1. Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

2. Plasma etching: principles, mechanisms, application to micro- and nano-technologies

3. Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

4. A parallel algorithm for robust fault detection in semiconductor manufacturing processes

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