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Effect of N2/H2 plasma treatment on the moisture adsorption of MOCVD–TiN films

  • Published:2011-05 Issue:15 Volume:519 Page:4948-4951
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Huang J.K.,Huang Cheng-Liang,Chang Shih-Chieh,Cheng Yi-Lung,Wang Ying-Lang

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhancement of Ti-6Al-4V powder surface properties for cold spray deposition using fluidized Gas-Nitriding technique;Materials Letters;2021-05

2. The Inspection and Solution of Inline CT Defect for 28NM Process Improvement;2020 China Semiconductor Technology International Conference (CSTIC);2020-06-26

3. Optimization of a TiN PE-MOCVD Process Using DoE Methodology;ECS Journal of Solid State Science and Technology;2017

4. Chemical Vapor Deposition in Manufacturing;Handbook of Manufacturing Engineering and Technology;2014-09-30

5. Stability and etching of titanium oxynitride films in hydrogen microwave plasma;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-07
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