Initial growth mechanism of atomic layer deposited titanium dioxide using cyclopentadienyl-type precursor: A density functional theory study-Reference-Cited by-同舟云学术

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Initial growth mechanism of atomic layer deposited titanium dioxide using cyclopentadienyl-type precursor: A density functional theory study

Published:2012-12 Issue: Volume:524 Page:179-184
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zhou Guangfen,Ren Jie,Zhang Shaowen

Funder

National Natural Science Foundation of China

Natural Science Foundations of Hebei Province

Science Foundation for Distinguished Young Scholars of Hebei University of Science and Technology

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference65 articles.

1. Atomic Layer Deposition of High-kOxides of the Group 4 Metals for Memory Applications

2. Atomic layer deposition of photocatalytic TiO2 thin films from TiF4 and H2O

3. Growth of titanium dioxide thin films by atomic layer epitaxy

4. Anomalous effect of temperature on atomic layer deposition of titanium dioxide

5. In Situ Quadrupole Mass Spectrometry and Quartz Crystal Microbalance Studies on the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetrachloride and Water

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Role of Cyclopentadienyl Ligands of Group 4 Precursors toward High-Temperature Atomic Layer Deposition;The Journal of Physical Chemistry C;2022-10-13

2. Kinetic study on initial surface reaction of titanium dioxide growth using tetrakis(dimethylamino)titanium and water in atomic layer deposition process: Density functional theory calculation;Chemical Physics;2022-10

3. Kinetic Study of Tetrakis(Dimethylamido)Titanium and Titanium Tetrachloride Adsorption on a Silicon Surface in Atomic Layer Deposition: A DFT Calculation;Integrated Ferroelectrics;2022-05-04

4. Thermal stability and reactivity of titanium halide precursors for the atomic layer deposition of TiO2 on a Pt (111) surface;Procedia CIRP;2020

5. Titanium dioxide thin films by atomic layer deposition: a review;Semiconductor Science and Technology;2017-08-23

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