Influence of generation control of the magnetron plasma on structure and properties of copper nitride layers
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference21 articles.
1. Copper nitride layers synthesized by pulsed magnetron sputtering;Nowakowska - Langier;Thin Solid Films,2018
2. Relation between modulation frequency of electric power oscillation during pulse magnetron sputtering deposition of MoNx thin films;Wicher;Appl. Surf. Sci.,2018
3. Phase composition of copper nitride coatings examined by the use of x - ray diffraction and raman spectroscopy;Nowakowska - Langier;J. Mol. Struct.,2018
4. Influence of modulation frequency on the synthesis of thin films in pulsed magnetron sputtering processes;Strzelecki;Mater. Sci. - Pol.,2018
5. Structure of cu–n layers synthesized by pulsed magnetron sputtering with variable frequency of plasma generation;Nowakowska - Langier;Nucl. Instrum. Methods Phys. Res. B: Beam Interact. Mater. Atoms,2017
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1. A novel method for fabricating semiconducting monocrystalline copper nitride nanowires for optoelectronic applications;Journal of Crystal Growth;2023-09
2. Advances in nanostructure thin film materials for solar cell applications;Reference Module in Materials Science and Materials Engineering;2023
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4. Stable stoichiometric copper nitride thin films via reactive sputtering;Applied Physics A;2022-06-15
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