Structure of Cu–N layers synthesized by pulsed magnetron sputtering with variable frequency of plasma generation-Reference-Cited by-同舟云学术

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Structure of Cu–N layers synthesized by pulsed magnetron sputtering with variable frequency of plasma generation

Published:2017-10 Issue: Volume:409 Page:167-170
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Nowakowska-Langier Katarzyna,Chodun Rafal,Minikayev Roman,Kurpaska Lukasz,Skowronski Lukasz,Strzelecki G.W.,Okrasa Sebastian,Zdunek Krzysztof

Funder

National Science Centre

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference22 articles.

1. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

2. Ionized physical vapor deposition (IPVD): A review of technology and applications

3. Gas injection as a tool for plasma process control during coating deposition

4. Optimization of gas injection conditions during deposition of AlN layers by novel reactive GIMS method

5. Novel GIMS technique for deposition of colored Ti/TiO₂ coatings on industrial scale

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1. Multi-component low and high entropy metallic coatings synthesized by pulsed magnetron sputtering;Surface and Coatings Technology;2022-09

2. The Effect of Pulse Duration on the Structure and Mechanical, Tribotechnical, and Optical Characteristics of Zr–B–N Coatings Obtained by the PMS Method;Protection of Metals and Physical Chemistry of Surfaces;2021-11

3. The influence of thermal stability on the properties of Cu3N layers synthesized by pulsed magnetron sputtering method;Thin Solid Films;2021-10

4. Mechanical properties of cubic Cu3N and Cu4N: A theoretical investigation;Vacuum;2021-09

5. Copper Nitride Nanowire Arrays—Comparison of Synthetic Approaches;Materials;2021-01-28

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