Structural and electrical characterisation of high-k ZrO2 thin films deposited by chemical spray pyrolysis method-Reference-Cited by-同舟云学术

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Structural and electrical characterisation of high-k ZrO2 thin films deposited by chemical spray pyrolysis method

Published:2018-09 Issue: Volume:662 Page:129-136
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Oluwabi Abayomi T.^ORCID,Acik Ilona Oja,Katerski Atanas^ORCID,Mere Arvo,Krunks Malle

Funder

Estonian Ministry of Education and Research

European Regional Development Fund

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference36 articles.

1. Transparent Oxide Electronics, United Kingdom: John Wiley and Sons;Barquinha,2012

2. Fundamental limit of gate oxide thickness scaling in advanced MOSFETs;Hirose;Semicond. Sci. Technol.,2000

3. High-performance fully amorphous bilayer metal-oxide thin film transistors using ultra-thin solution-processed ZrOx dielectric;Liu;J. Appl. Phys. Lett.,2014

4. Solution-deposited Zr-doped AlOx gate dielectrics enabling high-performance flexible transparent thin film transistors;Yang;J. Mater. Chem. C,2013

5. Fabrication by electrostatic spray deposition and structural investigation of ultra thin;Lintanf-Salaün;Thin Solid Films,2009

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3. Effect of Heat Treatment on Zirconium Oxide High‐k Gate Dielectric in Silicon‐Based Metal Oxide Semiconductor Capacitors;physica status solidi (a);2023-03-23

4. Cubic phase optimization and influence of post-annealing on microstructure, optical, wetting, and nanomechanical properties of zirconia thin films;Ceramics International;2023-01

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