Impact of annealing temperature and carbon doping on the wetting and surface morphology of semiconducting iron disilicide formed via radio frequency magnetron sputtering-Reference-Cited by-同舟云学术

Impact of annealing temperature and carbon doping on the wetting and surface morphology of semiconducting iron disilicide formed via radio frequency magnetron sputtering

Published:2020-09 Issue: Volume:709 Page:138248
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Charoenyuenyao Peerasil^ORCID,Promros Nathaporn,Chaleawpong Rawiwan,Borwornpornmetee Nattakorn,Sittisart Pattarapol,Tanaka Yūki,Yoshitake Tsuyoshi

Funder

Academic Research Fund

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

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3. Influence of annealing temperature on mechanical and wetting properties of β-FeSi2 films built using facing-targets direct-current sputtering;Charoenyuenyao;J. Nanosci. Nanotechnol.,2020

4. Epitaxial growth of semiconducting β-FeSi2 and its application to light-emitting diodes;Suemasu;Thin Solid Films,2004

5. Direct epitaxial growth of semiconducting β-FeSi2 thin films on Si(111) by facing targets direct-current sputtering;Yoshitake;Appl. Phys. Lett.,2006

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