Reverse bias dependent impedance and dielectric properties of Al/n-NC FeSi2/p-Si/Pd heterostructures formed by facing-targets sputtering

Author:

Borwornpornmetee NattakornORCID,Chaleawpong Rawiwan,Charoenyuenyao Peerasil,Nopparuchikun Adison,Paosawatyanyong Boonchoat,Sittimart Phongsaphak,Yoshitake Tsuyoshi,Promros NathapornORCID

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference71 articles.

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2. Semiconducting nanocrystalline iron disilicide thin films prepared by pulsed-laser ablation;Yoshitake;Appl. Phys. Lett.,2003

3. Transition from amorphous to crystalline beta phase in co-sputtered FeSi2 films as a function of temperature;Milosavljević;J. Appl. Phys.,2005

4. Electrical and photovoltaic properties of n-type nanocrystalline-FeSi2/p-type Si heterojunctions prepared by facing-targets direct-current sputtering at room temperature;Shaban;Jpn. J. Appl. Phys.,2008

5. n-Type nanocrystalline FeSi2/intrinsic Si/p-type Si heterojunction photodiodes fabricated by facing-target direct-current sputtering;Promros;Jpn. J. Appl. Phys.,2012

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