Wetting state and mechanical property alteration for the Fe3Si films using rapid thermal annealing under various temperatures-Reference-Cited by-同舟云学术

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Wetting state and mechanical property alteration for the Fe3Si films using rapid thermal annealing under various temperatures

Published:2023-12 Issue:12 Volume:9 Page:e22511
ISSN:2405-8440
Container-title:Heliyon
language:en
Short-container-title:Heliyon

Author:

Borwornpornmetee Nattakorn,Traiprom Thawichai,Kusaba Takafumi,Sittimart Phongsaphak^ORCID,Naragino Hiroshi,Paosawatyanyong Boonchoat,Yoshitake Tsuyoshi,Promros Nathaporn^ORCID

Funder

King Mongkut's Institute of Technology Ladkrabang

Publisher

Elsevier BV

Subject

Multidisciplinary

Reference45 articles.

1. Physical properties of Fe3Si films coated through facing targets sputtering after microwave plasma treatment;Borwornpornmetee;Coatings,2021

2. Room-temperature epitaxial growth of ferromagnetic Fe3Si films on Si(111) by facing target direct-current sputtering;Yoshitake;Appl. Phys. Lett.,2005

3. Fabrication of ferromagnetic Fe3Si thin films by pulsed laser deposition using an Fe3Si target;Nakagauchi;Vacuum,2004

4. Epitaxial growth of ferromagnetic silicide Fe3Si on Si(111) substrate;Sadoh;Jpn. J. Appl. Phys.,2006

5. Epitaxial ferromagnetic Fe3Si/Si(111) structures with high-quality heterointerfaces;Hamaya;Appl. Phys. Lett.,2008

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Temperature-dependent wetting and other physical characteristics of sputtered grown WO3 thin films;Bulletin of Materials Science;2024-07-04

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