Argon–oxygen plasma treatment of deposited organosilicon thin films-Reference-Cited by-同舟云学术

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Argon–oxygen plasma treatment of deposited organosilicon thin films

Published:2004-02 Issue:1-2 Volume:449 Page:40-51
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

van Hest M.F.A.M.,Klaver A.,Schram D.C.,van de Sanden M.C.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. Deposition of organosilicon thin films using a remote thermal plasma

2. Chemical etching of thin SiOxCyHz films by post-deposition exposure to oxygen plasma

3. Improvement of hardness in plasma polymerized hexamethyldisiloxane coatings by silica-like surface modification

4. Crosslinked polydimethylsiloxane exposed to oxygen plasma studied by neutron reflectometry and other surface specific techniques

5. Fast deposition of amorphous hydrogenated carbon films using a supersonically expanding arc plasma

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1. Comparative analysis of hexamethyldisiloxane and hexamethyldisilazane plasma polymer thin films before and after plasma oxidation;Plasma Processes and Polymers;2022-05-20

2. Effect of Plasma Oxidation Treatment on Production of a SiOx/SiOxCyHz Bilayer to Protect Carbon Steel Against Corrosion;Materials Research;2021

3. Observation of a significant drop of electron density in cascaded arc argon plasma doped with oxygen gas using laser Thomson scattering;Plasma Physics and Controlled Fusion;2020-12-23

4. Damage to porous SiCOH low-k dielectrics by O, N and F atoms at lowered temperatures;Journal of Physics D: Applied Physics;2020-02-24

5. Effect of Atmospheric Ageing on the Properties of Organosilicon (Pp-HMDSO) Thin Films;Silicon;2019-11-07

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