Deposition of organosilicon thin films using a remote thermal plasma-Reference-Cited by-同舟云学术

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Deposition of organosilicon thin films using a remote thermal plasma

Published:2004-02 Issue:1-2 Volume:449 Page:52-62
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

van Hest M.F.A.M.,Mitu B.,Schram D.C.,van de Sanden M.C.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference56 articles.

1. Chemical Vapor Deposition—Principles and Applications;Hitchman,1993

2. CVD of Nonmetals;Rees,1996

3. Silicon dioxide deposition in a microwave plasma reactor

4. Silicon oxide films from the Plasmodul®

5. Plasma enhanced chemical vapor deposition of SiO2 using novel alkoxysilane precursors

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3. Role of the Plasma Activation Degree on Densification of Organosilicon Films;Materials;2019-12-19

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