Author:
Wu Meiyi,de Marneffe Jean-François,Opsomer Karl,Detavernier Christophe,Delabie Annelies,Naujok Philipp,Caner Özge,Goodyear Andy,Cooke Mike,Saadeh Qais,Soltwisch Victor,Scholze Frank,Philipsen Vicky
Funder
Electronic Components and Systems for European Leadership
European Commission
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference22 articles.
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3. Proc. SPIE 11147, EUVL;Franke,2019
4. Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks;Wood;Proc. SPIE,2015
5. Novel EUV mask absorber evaluation in support of next-generation EUV imaging;Philipsen;Proc. SPIE,2018
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