Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma
Author:
Publisher
Elsevier BV
Subject
General Chemical Engineering
Reference8 articles.
1. Angular resolved x‐ray photoelectron spectroscopy study of reactively sputtered titanium nitride
2. Dry etching of titanium nitride thin films in CF4–O2 plasmas
3. Performance of different etch chemistries on titanium nitride antireflective coating layers and related selectivity and microloading improvements for submicron geometries obtained with a high-density metal etcher
4. Characterization of titanium nitride etch rate and selectivity to silicon dioxide in a Cl2 helicon-wave plasma
5. High-Density Plasma Etching of Iridium Thin Films in a Cl[sub 2]/O[sub 2]/Ar Plasma
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanometer – Thick titanium film as a silicon migration barrier;Materials Today Communications;2024-08
2. Etching characteristics and surface modification of InGaSnO thin films under Cl2/Ar plasma;Plasma Science and Technology;2023-06-27
3. Thermal gas-phase etching of titanium nitride (TiN) by thionyl chloride (SOCl2);Applied Surface Science;2021-02
4. A characteristic improved technique and analysis with plasma treatment to the electrode on oxide-based resistive random access memory;Journal of Alloys and Compounds;2020-03
5. Insertion of Ag Layer in TiN/SiNx/TiN RRAM and Its Effect on Filament Formation Modeled by Monte Carlo Simulation;IEEE Access;2020
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3