The role of gate leakage on surface-related current collapse in AlGaN/GaN HEMTs
Author:
Affiliation:
1. Brandenburg University of Technology Cottbus-Senftenberg (BTU),Germany
2. Technion-Israel Institute of Technology,Israel
Funder
Deutsche Forschungsgemeinschaft
Ministry of Education
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/10288583/10288635/10289036.pdf?arnumber=10289036
Reference12 articles.
1. Analysis of DC–RF Dispersion in AlGaN/GaN HFETs Using RF Waveform Engineering
2. Analysis of GaN-HEMT DC-Characteristic Alterations by Gate Encapsulation Layer;yazdani;2021 International Conference on Compound Semiconductor Manufacturing Technology,2021
3. Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures
4. Modeling of the Gate Leakage Current in AlGaN/GaN HFETs
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. A computational analysis of the impact of thin undoped channels in surface-related current collapse of AlGaN/GaN HEMTs;Semiconductor Science and Technology;2024-08-20
2. Investigation of Traps Impact on PAE and Linearity of AlGaN/GaN HEMTs Relying on a Combined TCAD–Compact Model Approach;IEEE Transactions on Electron Devices;2024-06
3. Importance of Scaling in RF GaN HEMTs for Reduction of Surface Traps‐Induced Drain Lag;physica status solidi (a);2024-04-26
4. Dynamic RDModeling by Exploiting Gate Current Dependency of Virtual Gate Effect;2023 18th European Microwave Integrated Circuits Conference (EuMIC);2023-09-18
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