The role of gate leakage on surface-related current collapse in AlGaN/GaN HEMTs

Author:

Zervos Christos1,Beleniotis Petros1,Krause Sascha1,Ritter Dan2,Rudolph Matthias1

Affiliation:

1. Brandenburg University of Technology Cottbus-Senftenberg (BTU),Germany

2. Technion-Israel Institute of Technology,Israel

Funder

Deutsche Forschungsgemeinschaft

Ministry of Education

Publisher

IEEE

Reference12 articles.

1. Analysis of DC–RF Dispersion in AlGaN/GaN HFETs Using RF Waveform Engineering

2. Analysis of GaN-HEMT DC-Characteristic Alterations by Gate Encapsulation Layer;yazdani;2021 International Conference on Compound Semiconductor Manufacturing Technology,2021

3. Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures

4. Modeling of the Gate Leakage Current in AlGaN/GaN HFETs

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