Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation for amorphous InGaZnO thin-film transistors
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/11/i=6/a=061103/pdf
Reference33 articles.
1. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors
2. Bottom-Gate Gallium Indium Zinc Oxide Thin-Film Transistor Array for High-Resolution AMOLED Display
3. Origin of threshold voltage instability in indium-gallium-zinc oxide thin film transistors
4. Effects of ambient atmosphere on the transfer characteristics and gate-bias stress stability of amorphous indium-gallium-zinc oxide thin-film transistors
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1. Low Cost, Al 2 O 3 and ZrAlO x Stack Passivation by Spray Pyrolysis for Highly Stable Amorphous InGaZnO Thin‐Film Transistors;Advanced Materials Interfaces;2022-08-17
2. Spray pyrolyzed fluorinated inorganic-organic passivation for solution-processed a-InZnO thin-film transistors;Materials Science in Semiconductor Processing;2022-08
3. Effects of carbon impurity in ALD-Al2O3 film on HAXPES spectrum and electrical properties of Al2O3/AlGaN/GaN MIS structure;Japanese Journal of Applied Physics;2022-05-24
4. Aluminum Precursor Interactions with Alkali Compounds in Thermal Atomic Layer Etching and Deposition Processes;ACS Applied Materials & Interfaces;2021-01-11
5. Improvement in Bias Stress Stability of Solution-Processed Amorphous InZnO Thin-Film Transistors via Low-Temperature Photosensitive Passivation;IEEE Electron Device Letters;2020-09
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