Investigation of large-area multicoil inductively coupled plasma sources using three-dimensional fluid model
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/55/i=7S2/a=07LD08/pdf
Reference43 articles.
1. Inductively Coupled Plasma Sources and Applications
2. A three‐dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
3. A new inductively coupled plasma source design with improved azimuthal symmetry control
4. Advanced plasma sources for the future 450mm etch process
5. Model for a large area multi‐frequency multiplanar coil inductively coupled plasma source
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