Model for a large area multi‐frequency multiplanar coil inductively coupled plasma source-Reference-Cited by-同舟云学术

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Model for a large area multi‐frequency multiplanar coil inductively coupled plasma source

Published:1996-09 Issue:5 Volume:14 Page:2859-2870
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Yamada Naoki,Ventzek Peter L. G.,Date H.,Sakai Y.,Tagashira H.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580236

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of large-area multicoil inductively coupled plasma sources using three-dimensional fluid model;Japanese Journal of Applied Physics;2016-06-23

2. The Effect of Bias Power on the Etching Rate and Uniformity of Silicon Dioxide for N-Slot Inductively Coupled Plasma in TFT Application;Solid State Phenomena;2007-06

3. Improved etching characteristics of silicon-dioxide by enhanced inductively coupled plasma;Surface and Coatings Technology;2000-11

4. A New Inside-Type Segmented Coil Antenna for Uniformity Control in a Large-Area Inductively Coupled Plasma;Japanese Journal of Applied Physics;2000-06-01

5. Improvement of ICP plasma with periodic control of axial magnetic field;Surface and Coatings Technology;1999-11

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