Inductively Coupled Plasma Sources and Applications-Reference-Cited by-同舟云学术

Inductively Coupled Plasma Sources and Applications

Published:2010-02-20 Issue: Volume:2010 Page:1-14
ISSN:2090-2220
Container-title:Physics Research International
language:en
Short-container-title:Physics Research International

Author:

Okumura Tomohiro¹^ORCID

Affiliation:

1. Production Engineering Laboratory, Panasonic Corporation, 2-7, Matsuba-Cho, Kadoma, Osaka 571-8502, Japan

Abstract

The principle of inductively coupled plasma (ICP) and perspective of ICP development are reviewed. Multispiral coil ICP (MSC-ICP), which has the advantages of low inductance, high efficiency, and excellent uniformity, is discussed in detail. Applications to thin film processing technologies and the future prospects of ICP are also described.

Publisher

Hindawi Limited

Subject

General Physics and Astronomy

Link

http://downloads.hindawi.com/archive/2010/164249.pdf

Reference21 articles.

1. Review of inductively coupled plasmas for plasma processing

2. Electron‐density and energy distributions in a planar inductively coupled discharge

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