Mist chemical vapor deposition of aluminum oxide thin films for rear surface passivation of crystalline silicon solar cells
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,General Engineering
Link
http://stacks.iop.org/1882-0786/7/i=2/a=021303/pdf
Reference40 articles.
1. Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al2O3
2. Very low surface recombination velocities on p-type silicon wafers passivated with a dielectric with fixed negative charge
3. Ultralow surface recombination of c-Si substrates passivated by plasma-assisted atomic layer deposited Al2O3
4. Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3
5. Negative charge and charging dynamics in Al[sub 2]O[sub 3] films on Si characterized by second-harmonic generation
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