Mist Chemical Vapor Deposition Using Poorly Soluble Particles as Raw Material

Abstract

AbstractMist chemical vapor deposition (mist‐CVD) is expected to be a potentially low‐environment‐impact and low‐cost crystal growth technique. With mist‐CVD, soluble materials are usually selected as raw materials, and mist is usually generated from an aqueous solution including raw materials. However, any substances to be included in the mist can be potentially supplied as raw materials. Namely, there is no need for the substances to be dissolved in some solvent. Therefore, as a trial, it is demonstrated that mist including poorly soluble particles are used as raw materials for mist‐CVD crystal growth.