CMOS integration of high-k/metal gate transistors in diffusion and gate replacement (D&GR) scheme for dynamic random access memory peripheral circuits
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://stacks.iop.org/1347-4065/57/i=4S/a=04FB08/pdf
Reference32 articles.
1. Optimized material solutions for advanced DRAM peripheral transistors
2. (Invited) The Past, Present and Future of High-k/Metal Gates
3. Gate-first high-k/metal gate DRAM technology for low power and high performance products
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