A Platform for Complementary Metal‐Oxide‐Semiconductor Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with a MgO Interlayer-Reference-Cited by-同舟云学术

A Platform for Complementary Metal‐Oxide‐Semiconductor Compatible Plasmonics: High Plasmonic Quality Titanium Nitride Thin Films on Si (001) with a MgO Interlayer

Published:2021-05-24 Issue:7 Volume:2 Page:2000210
ISSN:2699-9293
Container-title:Advanced Photonics Research
language:en
Short-container-title:Adv Photo Res

Author:

Ding Kai¹^ORCID,Fomra Dhruv¹,Kvit Alexander V.²,Morkoç Hadis¹,Kinsey Nathaniel¹,Özgür Ümit¹,Avrutin Vitaliy¹

Affiliation:

1. Department of Electrical and Computer Engineering Virginia Commonwealth University Richmond VA 23284 USA

2. Materials Science Center University of Wisconsin-Madison Madison WI 53706 USA

Funder

National Science Foundation

Air Force Office of Scientific Research

Publisher

Wiley

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adpr.202000210

Reference64 articles.

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5. Examining nanophotonics for integrated hybrid systems: a review of plasmonic interconnects and modulators using traditional and alternative materials [Invited]

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