An In situ Analysis of the Dissolution Characteristics of Half Pitch Line and Space Extreme Ultraviolet Lithography Resist Patterns
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference30 articles.
1. Radiation Chemistry in Chemically Amplified Resists
2. The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm
3. A new inorganic EUV resist with high-etch resistance
4. Novel Noria (Water Wheel-Like Cyclic Oligomer) Derivative as a Chemically Amplified Extreme Ultraviolet (EUV)-Resist Material
5. Development of New Negative-tone Molecular Resists Based on Calixarene for EUV Lithography
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