Novel Noria (Water Wheel-Like Cyclic Oligomer) Derivative as a Chemically Amplified Extreme Ultraviolet (EUV)-Resist Material-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Novel Noria (Water Wheel-Like Cyclic Oligomer) Derivative as a Chemically Amplified Extreme Ultraviolet (EUV)-Resist Material

Published:2009 Issue:1 Volume:22 Page:73-76
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Nishikubo Tadatomi,Kudo Hiroto,Suyama Yuji,Oizumi Hiroaki,Itani Toshihiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/1/22_1_73/_pdf

Reference23 articles.

1. Recent Progress in ArF Lithography for the 100nm Node.

2. (b) H. Ito, J. Polym. Sci. Part A: Polym. Chem., 41, 3863 (2003).

3. Chemical Amplification in High-Resolution Imaging Systems

4. (b) C. G. Willson, B. C. Trinque, B. P. Osborn, C. Chambers, R. Y. Hedieh, T. Chiba, P. Zimmerma, D. Miller, W. Conley, J. Photopolym. Sci. Tecnol., 15, 583 (2002).

5. New Strategies for High Resolution Photoresists.

Cited by 51 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Trends in photoresist materials for extreme ultraviolet lithography: A review;Materials Today;2023-07

2. Design of High-sensitive Resist Materials Based on Polyacetals;Journal of Photopolymer Science and Technology;2023-06-15

3. Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool;Journal of Photopolymer Science and Technology;2022-12-16

4. Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure;Journal of Photopolymer Science and Technology;2021-06-11

5. Noria and its derivatives as hosts for chemically and thermally robust Type II porous liquids;Chemical Science;2021

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3