The Design of Resist Materials for 157nm Lithography.-Reference-Cited by-同舟云学术

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The Design of Resist Materials for 157nm Lithography.

Published:2002 Issue:4 Volume:15 Page:583-590
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Willson C. Grant,Trinque Brian C.,Osborn Brian P.,Chambers Charles R.,Hsieh Yu-Tsai,Chiba Takashi,Zimmerman Paul,Miller Daniel,Conley Willard

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/15/4/15_4_583/_pdf

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