Design of High-sensitive Resist Materials Based on Polyacetals-Reference-Cited by-同舟云学术

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Design of High-sensitive Resist Materials Based on Polyacetals

Published:2023-06-15 Issue:1 Volume:36 Page:31-39
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Maekawa Hiroyuki¹,Iwashige Yutaro²,Yamamoto Hiroki³,Okamoto Kazumasa²,Kozawa Takahiro²,Kudo Hiroto¹

Affiliation:

1. Department of Chemistry and Materials Engineering, Faculty of Chemistry, Materials and Bioengineering, Kansai University

2. National Institutes for Quantum and Radiological Science and Technology

3. Institute of Scientific and Industrial Research, Osaka University

Publisher

Technical Association of Photopolymers, Japan

Link

https://www.jstage.jst.go.jp/article/photopolymer/36/1/36_31/_pdf

Reference27 articles.

1. 1. J. Lee, J. Kim, S. Jeong, M. Lim, S. Koo, C. M. Lim, and Y. S. Kim, SPIE, 9776 (2016) 612.

2. 2. T. Kozawa and S. Tagawa, Jpn. J. Appl. Phys. 49 (2010) 030001.

3. 3. K. Matsuzawa, T. Fujii, S. Matsumura, T. Yamada, Y. Komuro, D. Kawana and K. Ohmori, J. Photopolym. Sci. Technol., 29 (2016) 489.

4. 4. L. Li, X. Liu, S. Pal, S. Wang, C. K. Ober, and E. Giannelis, P. Chem. Soc. Rev., 46 (2017) 4855.

5. 5. A. Narasimhan, L. Wisehart, S. Grzeskowiak, L. E. Ocola, G. Denbeaux, and R. L. Brainard, J. Photopolym. Sci. Tech., 30 (2017) 113.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity;Journal of Photopolymer Science and Technology;2024-06-25

2. Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity;Journal of Photopolymer Science and Technology;2024-06-25

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