Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films-Reference-Cited by-同舟云学术

Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Published:2013-11-01 Issue:11S Volume:52 Page:11NB05
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Takenaka Kosuke,Setsuhara Yuichi,Ebe Akinori

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference24 articles.

1. Microwave dielectric properties of SiC(B) solid solution powder prepared by sol–gel

2. Effects of substrate temperature on structural properties of undoped silicon thin films

3. Structural properties of polycrystalline silicon films prepared at low temperature by plasma chemical vapor deposition

4. Heterogeneity in microcrystalline-transition state: Origin of Si-nucleation and microcrystallization at higher rf power from Ar-diluted SiH4 plasma

5. Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD

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