Effect of Post-Chemical–Mechanical Polishing Surface Treatments on the Interfacial Adhesion Energy between Cu and a Capping Layer
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference40 articles.
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4. Effects of Post-annealing and Co Interlayer Between SiNx and Cu on the Interfacial Adhesion Energy for Advanced Cu Interconnections;Electronic Materials Letters;2020-04-07
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