Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Reduction of chlorine radical chemical etching of GaN under simultaneous plasma-emitted photon irradiation

Published:2017-07-24 Issue:8 Volume:10 Page:086502
ISSN:1882-0778
Container-title:Applied Physics Express
language:
Short-container-title:Appl. Phys. Express

Author:

Liu Zecheng,Imamura Masato,Asano Atsuki,Ishikawa Kenji,Takeda Keigo,Kondo Hiroki,Oda Osamu,Sekine Makoto,Hori Masaru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,General Engineering

Link

http://stacks.iop.org/1882-0786/10/i=8/a=086502/pdf

Reference28 articles.

1. GaN, AlN, and InN: A review

2. Optically pumped lasing properties of $(1\bar{1}01)$ InGaN/GaN stripe multiquantum wells with ridge cavity structure on patterned (001) Si substrates

3. High-fmaxGaN HEMT with high breakdown voltage over 100 V for millimeter-wave applications

4. Reactive ion etching of GaN using BCl3

5. High density plasma etching of III–V nitrides

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. GaN damage-free cyclic etching by sequential exposure to Cl2 plasma and Ar plasma with low Ar+-ion energy at substrate temperature of 400 °C;Journal of Applied Physics;2023-01-24

2. The effect of dry etching condition on the performance of blue micro light-emitting diodes with reduced quantum confined Stark effect epitaxial layer;Journal of Applied Physics;2022-04-21

3. Evidence for anti-synergism between ion-assisted etching and in-plasma photoassisted etching of silicon in a high-density chlorine plasma;Journal of Vacuum Science & Technology A;2020-03

4. Elevated-temperature etching of gallium nitride (GaN) in dual-frequency capacitively coupled plasma of CH4/H2 at 300–500 °C;Vacuum;2018-10

5. Reaction mechanisms between chlorine plasma and a spin-on-type polymer mask for high-temperature plasma etching;Japanese Journal of Applied Physics;2018-08-31

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3