Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility-Reference-Cited by-同舟云学术

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Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

Published:2016-05-11 Issue:6S1 Volume:55 Page:06GC01
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Iguchi Haruki,Hashimoto Hiraku,Kuki Masaki,Harada Tetsuo,Kinoshita Hiroo,Watanabe Takeo,Platonov Yuriy Y.,Kriese Michael D.,Rodriguez Jim R.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://stacks.iop.org/1347-4065/55/i=6S1/a=06GC01/pdf

Reference31 articles.

1. Reflectivity of Mo/Si multilayer systems for EUVL

2. Progress in Mo/Si multilayer coating technology for EUVL optics

3. Multilayer coatings for the EUVL process development tool

4. EUV source collector

5. Characterization of the PTB EUV reflectometry facility for large EUVL optical components

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