Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using phase-sensitive EUV imaging reflectometry

Author:

Tanksalvala Michael1ORCID,Porter Christina L.1ORCID,Esashi Yuka1ORCID,Wang Bin1,Jenkins Nicholas W.1ORCID,Zhang Zhe1,Miley Galen P.2ORCID,Knobloch Joshua L.1ORCID,McBennett Brendan1ORCID,Horiguchi Naoto3ORCID,Yazdi Sadegh4ORCID,Zhou Jihan15,Jacobs Matthew N.1ORCID,Bevis Charles S.1ORCID,Karl Robert M.1ORCID,Johnsen Peter1,Ren David16ORCID,Waller Laura16ORCID,Adams Daniel E.1ORCID,Cousin Seth L.7,Liao Chen-Ting1ORCID,Miao Jianwei15ORCID,Gerrity Michael1ORCID,Kapteyn Henry C.17ORCID,Murnane Margaret M.1

Affiliation:

1. STROBE Science and Technology Center, JILA, University of Colorado, Boulder, CO 80309, USA.

2. Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, IL 60208, USA.

3. Imec, Kapeldreef 75, 3001 Leuven, Belgium.

4. Renewable and Sustainable Energy Institute (RASEI), University of Colorado, Boulder, CO 80309, USA.

5. Department of Physics and Astronomy and California NanoSystem Institute, University of California, Los Angeles, CA 90095, USA.

6. Department of Electrical Engineering and Computer Sciences, University of California, Berkeley, CA 94720, USA.

7. KMLabs Inc., 4775 Walnut St. #102, Boulder, CO 80301, USA.

Abstract

A new imaging technique enables nondestructive, 3D characterization of nanostructures, their composition, and interfaces.

Funder

NSF Office of the Director

Gordon and Betty Moore Foundation

Defense Sciences Office, DARPA

Publisher

American Association for the Advancement of Science (AAAS)

Subject

Multidisciplinary

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