<title>Progress in Mo/Si multilayer coating technology for EUVL optics

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Progress in Mo/Si multilayer coating technology for EUVL optics

Published:2000-07-21 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Louis Eric,Yakshin Andrey E.,Goerts Peter C.,Oestreich Sebastian,Stuik R.,Maas Edward L. G.,Kessels M. J. H.,Bijkerk Fred,Haidl Markus,Muellender Stefan,Mertin Michael,Schmitz Detlef,Scholze Frank,Ulm Gerhard

Publisher

SPIE

Cited by 51 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Multilayer Optics for Synchrotron Applications;Advanced Materials Technologies;2024-04-20

2. 6.X nm下一代极紫外多层膜技术研究进展;Chinese Journal of Lasers;2024

3. Comparison of thermal stability of Mo/Si multilayers with different crystallinities of Mo layers;Applied Optics;2023-03-24

4. Investigation of long term stability of W/B4C multilayer structures;Thin Solid Films;2022-08

5. Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications;Applied Surface Science;2020-03

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